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Pulsed Laser Deposition as production solution

Technology

Pulsed laser deposition

Solmates' thin film process equipment is based on pulsed laser deposition (PLD). PLD is a Physical Vapour Deposition (PVD) process that offers many advantages above other conventional techniques, like the one-to-one transfer of elements from target to substrate, the ultra low damage to substrates, low temperature growth and excellent control of density. PLD can be compared with Sputtering, only that the plasma is generated by a UV laser irradiation instead of Argon ion bombardment.

PLD has been used for deposition on small scale samples (10 x 10 mm) since 1961. Since then many unique processes were developed but never on wafer scale. Solmates developed PLD equipment for wafers up to 200mm that matches industrial standards. Solmates owns patents on critical aspects of revolutionary PLD technology as well as on specific processes.

Solmates' PLD technology is suitable to deposit many different materials, as can be seen in the overview below. Selected processes have been optimized for specific markets.

 

 Markets

 Application

 Materials

OLEDs and LEDs

Anti Reflection, TCOs, barriers

Al2O3, AZO, HfO2, IGZO, ITO, MgO, Mg-ZnO,  Ta2O5, ZnO, ZrO2

MEMS and NEMS

Sensing, actuation, acoustics

Al2O3, BiFeO3, KNN, LaNiO3, PbTiO3, Pb(Zr,Ti)O3, PMN-PT, SrRuO3

CMOS and power IC

High-k, passivation

AlN, Al2O3, CeO2, HfO2, MgO, SrTiO3, TiN, ZrO2,

Energy

SOFC, PV, batteries, thermoelectrics

YSZ, CIGS, Gd-CeO2, ITO, (La,Sr)(Co.Fe)O3, LixMnO2, LixCoO2, NaxCoO2, Zn1-xAlxO

Photonics

Electro-optics, IR-detection, waveguides

BaTiO3, ITO, LiNbO3, PLZT, Y3Fe5O12, ZnO

Memory

Magnetics, spintronics

BiFeO3, CoFe2O4, CrO2 , LSMO, MnFe2O4, MnO

Metals and conductors

Electrodes, reflectors, alloys, superconductors, metal-insulator transition

Ag, Au, Ba(Bi,Pb)O3, LaNiO3, Ni, Pd, Pt, SrRuO3, SrLaCuO4, V2O3, YBa2Cu3O7-x

Epitaxy

Templates, superlattices

CeO2, GaN, LaAlO3, MgO, SrTiO3, TiN, YSZ