We have in-house equipment to deposit high quality PZT and oxide electrodes on 4-6” wafers. After the testing and evaluation phase we can become your reliable supplier of wafers with customized PZT thin films.

Wafers and substrates processed with PZT

A variety of substrates and wafers, such as; sapphire, silicon, silicon oxide and silicon nitride, can be processed in our in-house deposition facility. We have the ability to deposit various compositions of piezoelectric thin films with a thickness ranging from 20 nm to 3 μm.

For example:
The PZTMD01 layers are 001 textured on silicon and have a:
Tc>300°C, d₃₃>85 pm/V, e_31f>10 C/m^2, coercive field>25 kV/cm, polarization>25 μC/cm².

Currently our PVD-Piezo equipment can process up to 50 wafers a month with a PZT MD01 or other composition. Contact us for more information.