To produce in high volumes, or for other reasons, we can integrate our production solution into the customer’s production line. Our HVM equipment for 4” and 6” wafers is expected to be available in the beginning of 2011. PVD-PLD Technology Our PVD deposition tool is based on Pulsed Laser Deposition (PLD). PLD technology is an established technique mainly used for small samples (Link). We have successfully optimized the PLD technology to process wafers up to 6” without loss of quality (several patents pending). The PLD equipment has a competitive edge on throughput compared to market standard techniques for deposition of PZT layers (Sol-Gel, MOCVD, Sputtering). Equipment Our first PLD equipment for the open market is currently in development. This system is based on the various PLD systems we have in-house (used for in-house production and demo’s). To meet the various customer requirements, low maintenance and cost efficiency, our equipment is modular built. Currently a throughput of <1000 wafers/month can be achieved on this equipment (based on 1 reactor & deposition of 500 nm PZT). For more information and availability, please contact us.
