SolMateS offers the PiezoFlare 1200 to deposit thin films of PbZrTiOx (PZT) onto 6" and 8" wafers. A new-generation deposition system based on pulsed laser deposition. The PiezoFlare 1200 is fully automated and suitable for in-line production of PZT coatings onto silicon for various piezo MEMS applications. Our breakthrough system produces wafers with 1 to 3 µm thick PZT thin films with record displacement values. It offers a one-step process, where poling or post-annealing is unnecessary.

The PiezoFlare 1200 is designed and built in co-operation with experienced Dutch and German suppliers to the semiconductor industry. These suppliers also work for renowned companies such as ASML, Mapper and FEI components. A sound basis for high quality and yield.

The composition of PZT Thin Films can be customized for optimal performance. Furthermore, the same system can deposit an ultrathin oxygen diffusion barrier between the bottom electrode and PZT to prevent fatigue issues.

With one process chamber and a standard deposition source, a throughput of one wafer per hour is achieved. Upgrades exist for increased throughput .

Through demo processing and close collaboration, we support smooth process integration into your existing production line.